Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer.
| Author | |
|---|---|
| Abstract | :  Recent advance of high-power laser processing allows for rapid, continuous, area-selective material fabrication, typically represented by laser crystallization of silicon or oxides for display applications. Two-dimensional materials such as graphene exhibit remarkable physical properties and are under intensive development for the manufacture of flexible devices. Here we demonstrate an area-selective ultrafast nanofabrication method using low intensity infrared or visible laser irradiation to direct the self-assembly of block copolymer films into highly ordered manufacturing-relevant architectures at the scale below 12 nm. The fundamental principles underlying this light-induced nanofabrication mechanism include the self-assembly of block copolymers to proceed across the disorder-order transition under large thermal gradients, and the use of chemically modified graphene films as a flexible and conformal light-absorbing layers for transparent, nonplanar, and mechanically flexible surfaces. | 
| Year of Publication | :  2016 | 
| Journal | :  ACS nano | 
| Volume | :  10 | 
| Issue | :  3 | 
| Number of Pages | :  3435-42 | 
| Date Published | :  2016 | 
| ISSN Number | :  1936-0851 | 
| URL | :  https://doi.org/10.1021/acsnano.5b07511 | 
| DOI | :  10.1021/acsnano.5b07511 | 
| Short Title | :  ACS Nano | 
| Download citation | 
 
          